Atomic Layer Deposition (ALD) is a thin film growth technique that relies on two or more self-limiting chemical reactions. The technique offers precise control of film thickness on the sub-nm scale and exhibits a high degree of conformality, even on high aspect ratio and porous substrates. However, further development of this technique requires new in situ film measurement or modification during growth. During the Summer of 2016 we have assembled a multidisciplinary team of faculty, undergraduate, and graduate students to push the boundaries of ALD. We are seeking industrial partners that can help accelerate our developments. More info coming soon.
Custom ALD System and Team
ALD Mountaintop Team
Left to right: Ling Ju, Nick Johnson, Nick Strandwitz, Ben Pingrey, Zach Fink, Yinni Jin
Strandwitz Research Group
Bethlehem, PA 18015